anisotropic etching meaning in English
蛤异性腐蚀
各向异性刻蚀
各向异性蚀刻，非等向性蚀刻
Examples
- Computer simulation of silicon anisotropic etching
硅各向异性腐蚀的计算机模拟 - Silicon grating is a period construction fabricated on the silicon wafer by micro fabrication techniques as ultraviolet lithography and anisotropic etching
硅光栅是利用紫外光刻、各向异性腐蚀等硅微加工技术在硅片上制作的周期结构。 - The result of experiment proves that the design and manufacture project for silicon magnetic - transistor is feasible completely , specially , in the course of manufacturing magnetic - transistor technique , anisotropic etching is applied and reliable technique project is provided in order to manufacturing silicon magnetic - transistor with rectangle - plank cubic construction , these technologies can be compatible to ic technology , integrated easily and there is a wide application field
本文根据实验结果，确认了该硅磁敏三极管设计、制作方案完全可行。尤其在硅磁敏三极管的制作工艺中采用了硅各向异性腐蚀技术，为实现在硅片上制造具有矩形板状立体结构的硅磁敏三极管提供了可靠的技术方案。制作工艺不但能与ic工艺相兼容，而且便于集成化，将有广泛的应用领域。 - Based on silicon - piezoresistive method , the paper first gives the theory of array silicon piezoresistive pressure , acceleration sensor , and the design of its incorporated chip , microstructure and out - circuit . several key techniques of making array silicon piezoresistive pressure , acceleration sensor such as 1c technic , mems ( silicon - silicon direct bonding , anodic bonding , anisotropic etching ) is also studied . minuteness engine machining , anode bonding etc . in the paper there are three ways which are examine - form , curve simulanting , to carry out sensors non - linear self - emendating ; adopt the several curves approaching and curve simulating to achieve the aims of sensor error self compensation , fusion technology etc . therefore , it providing referenced values of ways and directions for sensor system directing on
论文首先以硅压阻效应原理为基础，讨论了阵列式硅压力、加速度传感器的设计原理，并对阵列式硅压力、加速度传感器中集成敏感芯片(压力、加速度) 、总体结构和压力阵列的信号处理电路进行了设计，在阵列式硅压力、加速度传感器的研制中，还研究了半导体平面工艺、大规模集成电路技术、微机械加工技术(硅硅键合、静电封接、各向异性腐蚀)等关键技术的应用。 - For the first time , an integrated waveguide turning mirror ( 1wtm ) in soi was put forward and realized . using anisotropic etching technology with koh solution , the mirror surface was very smooth with root square roughness only 5 . 19nm , and the mirror was vertical to the wafer surface because of the crystalline relationship
论文首次设计并制作了soi上集成波导式转弯微镜( iwtm ) ，利用硅的koh各向异性腐蚀特性制作出的微镜表面非常光亮，均方根粗糙仅为5 . 19nm ，并且由于镜面是腐蚀出的晶面，其与晶片表面非常垂直。